ADD APT PolySurF HPSi
Mixture of acrylated mono-and di-phosphate ester
ADD APT
流动/均化剂 >> 聚丙烯酸脂
Flow / Levelling agent >> Polyacrylate
光触发剂
Photoinitiator
滑动控制
Slip control
润湿剂/边缘润湿促进剂 >> 表面活性剂
Wetting agent/ Wet edge enhancer >> Surfactant
丙烯酸/丙烯酸盐树脂
Acrylic/Acrylate Resins
聚酯
Polyester
乙烯基
Vinyl
涂层 >> UV / 辐射线固化
Coatings >> UV / Radiation Curing
涂层 >> 水生
Coatings >> Waterborne
ADD APT PolySurF HPSi is a solvent-free UV-curable release and slip additive. It can also act as a co-polymerisable silicone surfactant.
It is a proprietary mixture of Acrylated mono-and di-Phosphate ester; the
mono-Phosphate being O-Polyether -(CH2)m-SiCH3{O-Si(CH3)2-O-Si(CH3)3}2
modified; where the reactive Acrylate group is Methacrylate)
Emulsions for paints, lacquers, printing inks and adhesives
As surfactant: 0.5 - 2.5 % wt. based on monomers
Polymerisable release and slip additive for polyacrylates, polyesters, PVC
Polymerisable wetting and levelling agent for coatings
Easy to handle liquid.
It shows an extreme and immediate release effect in UV-curing systems It also
improves the slip and scratch resistance of the formulation. It has an additional
de-aeration effect. No migration occurs after curing.
When used as a surfactant, it improves both the storage and mechanical stability of
an emulsion system, whereas foam formation is minimised.
No migration of the Silicone Surfactant occurs after film formation
This “build-in” Silicone Surfactant shows in water-based systems a tendency to
greatly lower the surface tension and improved slip properties.
The di-phosphate ester affords some degree of cross-linking without gel formation.
Mixture of methacrylated mono-and di-phosphate ester. Used as a solvent free UV-curable release and slip additive for paints, lacquers and printing inks and as a polymerisable wetting and levelling agent for coatings. Can be used as a co-polymerisable silicone surfactant. Offers easy handling and very good and immediate release effect. Improves slip and scratch resistance and storage and mechanical stability. Offers de-aeration effect and no migration. Reduces foam formation. Lowers surface tension in water-based systems. Gives some degree of cross-linking without gel formation.
Use level: 0.5-2.5 %wt based on monomers.